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химия полимеров

The complete step-by-step guide to mastering the basics of Aspen Plus software Used for a wide variety of important scientific tasks, Aspen Plus software is a modeling tool used for conceptual design, optimization, and performance monitoring of chemical processes. After more than twenty years, it remains one of the most popular and powerful chemical engineering programs used both industrially and academically. Teach Yourself the Basics of Aspen Plus, Second Edition continues to deliver important fundamentals on using Aspen Plus software. The new edition focuses on the newest version of Aspen Plus and covers the newest functionalities. Lecture-style chapters set the tone for maximizing the learning experience by presenting material in a manner that emulates an actual workshop classroom environment. Important points are emphasized through encouragement of hands-on learning techniques that direct learners toward achievement in creating effective designs fluidly and with confidence. Teach Yourself the Basics of Aspen Plus, Second Edition includes: Examples embedded within the text to focus the reader on specific aspects of the material being covered Workshops at the end of each chapter that provide opportunities to test the reader's knowledge in that chapter's subject matter Functionalities covered in the newest version of Aspen including the solution of a flowsheet by an equation oriented, EO approach, and the solution of problems which involve electrolyte equilibria Aspen Plus executable format as well as .txt format files containing details of the examples and the workshops as well as their solutions are provided as a download Designed with both students and professionals in mind, Teach Yourself the Basics of Aspen Plus, Second Edition is like having a personal professor 24/7. Its revolutionary format is an exciting way to learn how to operate this highly sophisticated software—and a surefire way for readers to get the results they expect. Ralph Schefflan has been an adjunct professor at Stevens Institute of Technology for the past thirty-five years. He has taught four graduate courses, thermodynamics, process simulation, numerical methods, and equilibrium stage operations during his time there as well as being SIT's representative to Aspen Technology. Dr. Schefflan introduced process simulation at SIT evolving from Flowtran to Aspen Plus and taught it for thirty years.


Ralph Schefflan

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